Micro-retarder array for imaging polarimetry in the visible wavelength, region

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4440, Issue , 2001, Pages 293-300

  Hamamoto, Tetsuya ^a   Toyota, Hiroshi ^b   Kikuta, Hisao ^c  

^a DAINIPPON SCREEN MFG CO LTD   (Japan)

^b OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

^c Osaka Prefecture University   (Japan)

Author keywords

Electron beam lithography; Polarimetry; Retarder array; Stokes parameters

Indexed keywords

BIREFRINGENCE; CHARGE COUPLED DEVICES; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; IMAGE SENSORS; IMAGING SYSTEMS; LIGHT POLARIZATION; OPTICAL FILMS; OPTICAL INSTRUMENT LENSES; REACTIVE ION ETCHING; SILICA;

MICRO-RETARDER ARRAYS;

POLARIMETERS;

EID: 0035759641     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.448051     Document Type: Article

References (5)

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