메뉴 건너뛰기




Volumn 5040 I, Issue , 2003, Pages 441-449

A methodology to calculate line-end correction feature performance as a function of reticle cost

Author keywords

Bridging; Line end; Pinching; Pullback; Reticle

Indexed keywords

ERROR CORRECTION; FEATURE EXTRACTION; FITS AND TOLERANCES; MASKS; OPTICAL DESIGN; OPTICAL VARIABLES MEASUREMENT;

EID: 0141833711     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485533     Document Type: Conference Paper
Times cited : (10)

References (6)
  • 1
    • 0037627760 scopus 로고    scopus 로고
    • Advanced write tool effects on 100nm node OPC
    • P. Buck, et. al., "Advanced Write Tool Effects on 100nm Node OPC," Proceedings of SPIE, Vol. 4889, 2002.
    • (2002) Proceedings of SPIE , vol.4889
    • Buck, P.1
  • 2
    • 0036415485 scopus 로고    scopus 로고
    • Adaptive OPC with a conformal target layout
    • R. Lugg,et. al., "Adaptive OPC with a Conformal Target Layout," Proceedings of SPIE, Vol. 4691, 2002.
    • (2002) Proceedings of SPIE , vol.4691
    • Lugg, R.1
  • 3
    • 0030313039 scopus 로고    scopus 로고
    • Customizing proximity correction for process-specific objectives
    • M. Rieger and J. Stirniman, "Customizing Proximity Correction for Process-Specific Objectives," Proceedings of SPIE, Vol. 2726, 1996.
    • (1996) Proceedings of SPIE , vol.2726
    • Rieger, M.1    Stirniman, J.2
  • 4
    • 0141431217 scopus 로고    scopus 로고
    • A fast resist image estimation methodology using light intensity distribution
    • K. Tsudaka, et. al., "A Fast Resist Image Estimation Methodology Using Light Intensity Distribution," Proceedings Of SPIE, Vol. 2512, 1996.
    • (1996) Proceedings of SPIE , vol.2512
    • Tsudaka, K.1
  • 5
    • 0029223306 scopus 로고
    • Reduction of ASIC gate-level line-end shortening by mask compensation
    • J. Garofalo, et. al., "Reduction of ASIC Gate-Level Line-End Shortening by Mask Compensation," Proceedings of SPIE, Vol. 2440, 1995.
    • (1995) Proceedings of SPIE , vol.2440
    • Garofalo, J.1
  • 6
    • 4243532208 scopus 로고    scopus 로고
    • A novel approach to simulate the effect of optical proximity on MOSFET parametric yield
    • A. Balasinki, et. al., "A Novel Approach to Simulate the Effect of Optical Proximity on MOSFET Parametric Yield," IEDM, Washington D.C., 1999. 1999.
    • IEDM, Washington D.C., 1999
    • Balasinki, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.