Customizing proximity correction for process-specific objectives

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 651-659

  Rieger, Michael L ^a   Stirniman, John P ^a  

^a Precim Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR CORRECTION; INTEGRATED CIRCUIT MANUFACTURE; MASKS; OPTIMIZATION; SENSITIVITY ANALYSIS;

PROXIMITY CORRECTION;

LITHOGRAPHY;

EID: 0030313039     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240930     Document Type: Conference Paper

References (6)

1. Fast proximity correction with zone sampling
2. Quantifying proximity and related effects in advanced wafer processes
3. Practical evaluation of optical proximity effect correction by EDM methodology
4. Automatic optical proximity correction with optimization of stepper condition
5. Feature biasing versus feature-assisted lithography...
6. Reduction of ASIC gate-level line-end shortening by mask compensation