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Volumn 863, Issue , 2005, Pages 227-232

Thermal oxidation of Cu interconnects capped with CoWP

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; DIELECTRIC MATERIALS; INTERCONNECTION NETWORKS; OXIDATION; OXIDES;

EID: 28844452556     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-863-b6.11     Document Type: Conference Paper
Times cited : (4)

References (12)
  • 12
    • 0000112472 scopus 로고
    • Ed. N.G. Einspruch and G.B. Larrabee, Academic Press, NY
    • M.A. Nicolet, S.S. Lau, in VLSI Microelectronics Science, vol. 6, Ed. N.G. Einspruch and G.B. Larrabee, Academic Press, NY, 1983, p. 329.
    • (1983) VLSI Microelectronics Science , vol.6 , pp. 329
    • Nicolet, M.A.1    Lau, S.S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.