Effect of ramping-up rate on film thickness for spin-on processing

Journal of Materials Science: Materials in Electronics

Volumn 16, Issue 11-12, 2005, Pages 715-720

  Birnie III, Dunbar P ^a   Hau, Steven K ^a   Kamber, Derrick S ^a   Kaz, David M ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; DIFFERENTIAL EQUATIONS; FLOW OF FLUIDS; MATHEMATICAL MODELS; SILICA; SOL-GELS; SPIN COATING; SUBSTRATES; THIN FILMS;

AMORPHOUS SILICON DIOXIDE; COATING THICKNESS; FLAT SUBSTRATES; SOL-GEL PRECURSORS; SPIN-ON PROCESSING; SPIN-SPEED; THIN COATINGS;

PROTECTIVE COATINGS;

EID: 28444491098     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-005-4973-6     Document Type: Article

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