Depth profile analysis of CVD-tungsten oxide thin films in hollow cathode discharge

Materials Letters

Volumn 60, Issue 4, 2006, Pages 535-537

  Gencheva, V ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Depth profiling; Glasses; Hollow cathode discharge; Thin films; Tungsten oxide

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; GLASS; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; TUNGSTEN COMPOUNDS;

DEPTH PROFILING; HOLLOW CATHODE DISCHARGE; TUNGSTEN OXIDE;

THIN FILMS;

EID: 28244485511     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.09.043     Document Type: Article

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