SCOPUS 정보 검색 플랫폼

Volumn 409, Issue 2, 2002, Pages 254-264

Nature of substoichiometry in reactively DC-sputtered tungsten oxide thin films and its effect on the maximum obtainable colouration by gases

(5) Stolze, M a Camin, B a Galbert, F a Reinholz, U b Thomas, L K a

a TECHNISCHE UNIVERSITÄT BERLIN (Germany)

b BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING (Germany)

Author keywords

Optical coatings; Optical properties; Tungsten oxide, X Ray photoelectron spectrometry

Indexed keywords

CHARGE TRANSFER; COMPOSITION; ELECTRIC RESISTANCE; LIGHT ABSORPTION; SPUTTER DEPOSITION; STOICHIOMETRY; TUNGSTEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

GASOCHROMIC MATERIALS;

THIN FILMS;

EID: 0037197374 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00058-5 Document Type: Article

Times cited : (45)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.