Molecular dynamics study of the angular dependence of reactive cluster impacts

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 241, Issue 1-4, 2005, Pages 594-598

  Aoki, Takaaki ^a,b,c   Matsuo, Jiro ^b  

^a Collaborative Research Center for Advanced Quantum Beam Process Technology ^*  (Japan)

^b KYOTO UNIVERSITY   (Japan)

^c Quantum Science and Engineering Center   (Japan)

Author keywords

Fluorine; Gas cluster ion beam; Molecular dynamics; Silicon; Sputtering

Indexed keywords

COLLIDING BEAM ACCELERATORS; COMPUTER SIMULATION; FLUORINE; MOLECULES; PROBABILITY; SEMICONDUCTING SILICON; SURFACE STRUCTURE;

GAS CLUSTER ION BEAMS; SILICON SURFACES; SPUTTERED PARTICLES; SURFACE PROFILE;

MOLECULAR DYNAMICS;

EID: 28044472478     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.07.108     Document Type: Conference Paper

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