Ge effects on silicidation

Microelectronic Engineering

Volumn 82, Issue 3-4 SPEC. ISS., 2005, Pages 467-473

  Besser, Paul R ^a   King, Paul ^b   Paton, Eric ^a   Robie, Stephen ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b Submicron Development Center   (United States)

Author keywords

Agglomeration; Cobalt silicide; Nickel silicide; Si Ge; Silicide

Indexed keywords

AGGLOMERATION; COBALT; CONCENTRATION (PROCESS); NICKEL; TEMPERATURE DISTRIBUTION; THERMODYNAMIC STABILITY;

COBALT SILICIDE; NICKEL SILICIDE; SI-GE; SILICIDE;

GERMANIUM;

EID: 28044472256     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.044     Document Type: Conference Paper

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