The effect of abrasive hardness on the chemical-assisted polishing of (0001) plane sapphire

Journal of Materials Research

Volumn 20, Issue 2, 2005, Pages 504-520

  Zhu, Honglin ^a,b   Niesz, Dale E ^a,b   Greenhut, Victor A ^a,b   Sabia, Robert ^c  

^a Department of Ceramic and Materials Engineering ^*  (United States)

^b RUTGERS UNIVERSITY   (United States)

^c Science and Technology Division ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; ADHESION; ALUMINA; ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; CHEMICAL MODIFICATION; CHEMICAL POLISHING; HARDNESS; HYDRATION; PARTICLE SIZE ANALYSIS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

ABRASIVE HARDNESS; DIASPORE; MONOHYDRATE; PLANE SAPPHIRE;

SAPPHIRE;

EID: 28044469294     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2005.0072     Document Type: Article

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