Evaluation of an empirical model to estimate and optimize mechanical properties of PECVD SiC films

Journal of the Electrochemical Society

Volumn 152, Issue 11, 2005, Pages

  Pham, Hoa T M ^a   De Boer, Charles R ^a   Visser, Cassan C C G ^a   Sarro, Pasqualina M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRESS ANALYSIS;

DEPOSITION RATE; ETCH RATE; GAS FLOW RATES; SILICON CARBIDE (SIC) FILMS;

SILICON CARBIDE;

EID: 27944496537     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2060693     Document Type: Article

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