Low-thermal-budget and selective relaxation of stress gradients in gold micro-cantilever beams using ion implantation

Journal of Micromechanics and Microengineering

Volumn 15, Issue 12, 2005, Pages 2469-2478

  Kang, T J ^a   Kim, J G ^a   Lee, J S ^b   Lee, J H ^b   Hahn, J H ^c   Lee, H Y ^a   Kim, Y H ^a  

^a Seoul National University   (South Korea)

^b Korea Atomic Energy Research Institute   (South Korea)

^c Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD; ION IMPLANTATION; MICROMACHINING; PLASMAS; STIFFNESS; STRESS RELAXATION;

FINITE ANCHOR STIFFNESS; LOW-THERMAL-BUDGET; OXYGEN PLASMA; STRESS GRADIENT;

CANTILEVER BEAMS;

EID: 27944484778     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/15/12/032     Document Type: Article

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