Effect of copper ions implantation on corrosion behavior of zircaloy-4 in 1 M H 2 SO 4

Applied Surface Science

Volumn 252, Issue 5, 2005, Pages 1793-1800

  Peng, D Q ^a   Bai, X D ^a   Pan, F ^a   Sun, H ^a   Chen, B S ^b  

^a TSINGHUA UNIVERSITY   (China)

^b Jianzhong Chemical Cooperation   (China)

Author keywords

Auger electron spectroscopy (AES); Copper ion implantation; Corrosion resistance; X ray photoemission spectroscopy (XPS); Zircaloy 4

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CORROSION; CORROSION RESISTANCE; HYDROGEN SULFIDE; ION IMPLANTATION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER IONS; ZIRCALOY-4;

COPPER;

EID: 27944462265     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.131     Document Type: Article

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