Construction of an atomic layer deposition system for nano-device applications

Current Applied Physics

Volumn 6, Issue 2, 2006, Pages 171-173

  Noh, S J ^a   Lee, S K ^a   Kim, E H ^a   Kong, Y J ^a  

^a Dankook University   (South Korea)

Author keywords

ALD (atomic layer deposition); Co thin film; Ru thin film

Indexed keywords

DEPOSITION; PURGING; RUTHENIUM; THIN FILMS;

ATOMIC LAYER DEPOSITION (ALD); CO THIN FILMS; REACTANT GASES; RU THIN FILMS;

NANOSTRUCTURED MATERIALS;

EID: 27744608028     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2005.07.033     Document Type: Conference Paper

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