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Volumn 14, Issue 11-12, 2005, Pages 1906-1910

Effects of buffer layer materials and process conditions on growth mechanisms of forming networks of SWNTs by microwave plasma chemical vapor deposition

(3) Wang, W H a Peng, Y R a Kuo, C T a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

Buffer layer; Microwave plasma chemical vapor deposition (MPCVD); Networks; Single walled carbon nanotubes (SWNTs)

Indexed keywords

CATALYSTS; MICROWAVES; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

BUFFER LAYER; NETWORKS; SINGLE-WALLED CARBON NANOTUBES (SWNT);

CARBON NANOTUBES;

EID: 27744603070 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/j.diamond.2005.08.053 Document Type: Conference Paper

Times cited : (6)

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