Strong influence of buffer layer type on carbon nanotube characteristics

Carbon

Volumn 42, Issue 1, 2004, Pages 187-190

  De los Arcos, Teresa ^a   Garnier, M Gunnar ^a,d   Oelhafen, Peter ^a   Mathys, Daniel ^a   Seo, Jin Won ^b   Domingo, Concepción ^c   Vicente García Ramos, José ^c   Sánchez Cortés, Santiago ^c  

^a UNIVERSITY OF BASEL   (Switzerland)

^b EPFL   (Switzerland)

^c INSTITUTO DE ESTRUCTURA DE LA MATERIA   (Spain)

^d Universite de Neuchatel Institut de Physique   (Switzerland)

Author keywords

A. Carbon nanotubes; B. Chemical vapor deposition, Catalyst support; C. Photoelectron spectroscopy

Indexed keywords

ALUMINA; ANNEALING; CATALYST SUPPORTS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; IRON; NUCLEATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE ROUGHNESS; TITANIUM DIOXIDE; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

BUFFER LAYERS; EUTECTIC POINT;

CARBON NANOTUBES;

EID: 0344308344     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2003.10.020     Document Type: Article

References (9)

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