The effects on the field emission properties of silicon nanowires by different pre-treatment techniques of Ni catalysts layers

Diamond and Related Materials

Volumn 14, Issue 11-12, 2005, Pages 2105-2108

  Huang, Bohr Ran ^a   Hsu, Jung Fu ^a   Huang, Chien Seng ^a  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Electroless plating; Field emission property; Pretreatment technique; RF sputtering; Silicon nanowires (SiNWs)

Indexed keywords

CATALYSIS; CATALYSTS; CHEMICAL VAPOR DEPOSITION; ELECTROLESS PLATING; SILICON; SPUTTERING;

FIELD EMISSION PROPERTY; PRETREATMENT TECHNIQUE; RF SPUTTERING; SILICON NANOWIRES (SINW);

NANOSTRUCTURED MATERIALS;

EID: 27744539912     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.08.058     Document Type: Conference Paper

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