Density functional theory study on the oxidation mechanisms of aldehydes as reductants for electroless Cu deposition process

Electrochimica Acta

Volumn 51, Issue 5, 2005, Pages 906-915

  Shimada, T ^a   Sakata, K ^a   Homma, T ^a   Nakai, H ^a   Osaka, T ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

Cu deposition; Density Functional Theory (DFT); Electroless deposition process; Formaldehyde; Glyoxylic acid

Indexed keywords

ADSORPTION; ALDEHYDES; CARBOXYLIC ACIDS; COMPUTATIONAL METHODS; COPPER; DESORPTION; ELECTROPLATING; INTERFACES (MATERIALS); OXIDATION; REDUCTION;

CU DEPOSITION; DENSITY FUNCTIONAL THEORY (DFT); ELECTROLESS DEPOSITION PROCESS; GLYOXYLIC ACID;

ELECTROCHEMISTRY;

EID: 27644498107     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.04.051     Document Type: Conference Paper

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