Molecular orbital study on the reaction process of dimethylamine borane as a reductant for electroless deposition

Journal of Electroanalytical Chemistry

Volumn 559, Issue , 2003, Pages 131-136

  Homma, Takayuki ^a   Tamaki, Amiko ^a   Nakai, Hiromi ^a   Osaka, Tetsuya ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

Ab initio molecular orbital calculation; Copper; Dimethylamine borane; Electroless deposition; Metal nanostructure formation; Palladium; Reductant

Indexed keywords

BORON COMPOUNDS; CATALYST ACTIVITY; NANOSTRUCTURED MATERIALS; OXIDATION; PALLADIUM; PERMITTIVITY;

EXOTHERMIC REACTIONS; METAL NANOSTRUCTURE FORMATION;

ELECTROLESS PLATING;

EID: 0242573437     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(03)00042-1     Document Type: Conference Paper

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