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Volumn 2, Issue , 2005, Pages 1354-1357
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Fabrication of single crystal silicon resonators with narrow gaps
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Author keywords
CMP; DRIE; Epipoly; SOI
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Indexed keywords
CMP;
DRIE;
EPIPOLY;
SOI;
CHEMICAL VAPOR DEPOSITION;
ELECTROSTATICS;
OXIDES;
REACTIVE ION ETCHING;
SILICON;
SILICON ON INSULATOR TECHNOLOGY;
SILICON WAFERS;
SINGLE CRYSTALS;
RESONATORS;
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EID: 27544505356
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (12)
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References (8)
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