Ultimate technology for micromachining of nanometric gap HF micromechanical resonators

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2003, Pages 157-160

  Quevy, Emmanuel ^a   Legrand, Bernard ^a   Collard, Dominique ^b   Buchaillot, Lionel ^a  

^a INSTITUT D ELECTRONIQUE   (France)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; ELECTRODES; MASKS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; NANOTECHNOLOGY; NATURAL FREQUENCIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SILICON; SINGLE CRYSTALS;

CAPACITIVE GAPS; CLAMPED CLAMPED BEAM RESONATORS; MICROMECHANICAL RESONATORS; NANOMETRIC GAP;

CRYSTAL RESONATORS;

EID: 0038494580     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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7. E.Quévy, PhD. Dissertation, Dec. 2002