Deposition of amorphous carbon thin films by pulsed RF plasma CVD

Journal of Chemical Engineering of Japan

Volumn 38, Issue 8, 2005, Pages 593-599

  Kim, Dong Sun ^a   Kang, Tae Won ^a  

^a Kongju National University   (South Korea)

Author keywords

Amorphous carbon film; Bias voltage; PECVD; Pulsed plasma

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METHANE; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON WAFERS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON THIN FILMS; BIAS VOLTAGE; PULSED PLASMA;

AMORPHOUS MATERIALS;

CHEMICAL VAPOR DEPOSITION;

EID: 27544463737     PISSN: 00219592     EISSN: 00219592     Source Type: Journal    
DOI: 10.1252/jcej.38.593     Document Type: Article

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