Shape and size variations during nanopatterning of photoresist using near-field scanning optical microscope

Ultramicroscopy

Volumn 105, Issue 1-4, 2005, Pages 316-323

  Kwon, Sangjin ^a   Chang, Wonseok ^b   Jeong, Sungho ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

Nanolithography; Nanopatterning; Nsom

Indexed keywords

LIGHTING; NANOSTRUCTURED MATERIALS; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL MICROSCOPY; SCANNING;

ENERGY DENSITY; NANOPATTERNING; PATTERN SIZE; PROCESS VARIABLES;

PHOTORESISTS;

CADMIUM; HELIUM; NANOPARTICLE;

CONFERENCE PAPER; DENSITY; ENERGY; FEASIBILITY STUDY; ILLUMINATION; LASER; LASER MICROSCOPE; MOLECULAR PROBE; OPTICAL DENSITY; PARTICLE SIZE; PHOTOREACTIVITY; PIEZOELECTRICITY; SCANNING NEAR FIELD OPTICAL MICROSCOPY; SPECTRAL SENSITIVITY; SYNTHESIS;

EID: 27544447924     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2005.06.043     Document Type: Conference Paper

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