Photoemission electron microscopy as a tool for the investigation of optical near fields

Physical Review Letters

Volumn 95, Issue 4, 2005, Pages

  Cinchetti, M ^a,b   Gloskovskii, A ^a,b   Nepjiko, S A ^a,b   Schonhense G ^a,b   Rochholz, H ^b   Kreiter, M ^b  

^a JOHANNES GUTENBERG UNIVERSITY   (Germany)

^b MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FEMTOSECOND LASER; PHOTOEMISSION ELECTRON MICROSCOPY; SILVER PLASMON FREQUENCY;

ELECTRON MICROSCOPY; ELECTRONS; NANOSTRUCTURED MATERIALS; ULTRAVIOLET RADIATION;

PHOTOEMISSION;

EID: 27144461179     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.95.047601     Document Type: Article

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