Models for grain boundary diffusion in thin films under stress fields in different kinetic regimes

Materials Science Forum

Volumn 294-296, Issue , 1999, Pages 553-556

  Ostrovsky, A ^a   Balandina, N ^a   Bokstein, B ^a  

^a NATIONAL UNIVERSITY OF SCIENCE AND TECHNOLOGY MISIS   (Russian Federation)

Author keywords

Diffusion; Grain Boundary; Stress; Thin films

Indexed keywords

EID: 26544476129     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Article

References (13)

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13. J.C.M. Hwang, R.W. Balluffi, J. Appl. Physics 50 (1979), p. 1339.