The effect of pressure on diffusion

Defect and Diffusion Forum

Volumn 129-130, Issue , 1996, Pages 57-74

  Mehrer, H ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Activation volume; Amorphous metals; Diffusion under pressure; Metals; Self diffusion; Semiconductors; Solute diffusion

Indexed keywords

EID: 0242669640     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.129-130.57     Document Type: Article

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