Ion beam etching of high resolution structures in Ta 2 O 5 for grating-assisted directional coupler applications

Applied Surface Science

Volumn 252, Issue 4, 2005, Pages 1006-1012

  Perentos, Andreas ^a   Mitchell, Arnan ^a   Holland, Anthony ^a  

^a RMIT UNIVERSITY   (Australia)

Author keywords

Grating assisted directional coupler; High resolution; Ion beam etching IBE; Tantalum oxide Ta 2 O 5

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION GRATINGS; ETCHING; FABRICATION; IMAGING TECHNIQUES; SCANNING ELECTRON MICROSCOPY; TANTALUM COMPOUNDS;

CROSS SECTIONAL PROFILES; GRATING-ASSISTED DIRECTIONAL COUPLERS (GADC); HIGH RESOLUTION; ION BEAM ETCHING (IBE);

ION BEAMS;

EID: 26444620232     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.01.153     Document Type: Article

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