Nanoscratch behavior of dendrimer-mediated Ti thin films

Tribology Letters

Volumn 19, Issue 4, 2005, Pages 273-280

  Li, X ^a,c   Huang, F ^a   Curry, M ^b   Street, S C ^a,b   Weaver, M L ^a,c  

^a The University of Alabama   (United States)

^b UNIVERSITY OF ALABAMA   (United States)

^c University of Alabama   (United States)

Author keywords

Dendrimer; failure mode; Nanoscratch; Ti film

Indexed keywords

FILM;

EID: 26044454130     PISSN: 10238883     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11249-005-7444-6     Document Type: Article

References (29)

1. A. Krishnamoorthy K. Chanda S.P. Murarka and G. Ramanath 2001 Appl. Phys. Lett. 78 2467 10.1063/1.1365418
2. G. Ramanath G. Cui P.G. Ganesan X. Guo A.V. Ellis M. Stukowski and K. Vijayamohanan 2003 Appl. Phys. Lett. 83 383 10.1063/1.1591232
3. N. Mikami N. Hata T. Kikkawa and H. Machida 2003 Appl. Phys. Lett. 83 5181 10.1063/1.1635665
4. L.A. Baker F.P. Zamborini L. Sun and R.M. Crooks 1999 Anal. Chem. 71 4403 10.1021/ac990495e
5. X. Li F. Huang M. Curry S.C. Street and M.L. Weaver 2005 Thin Solid Films 473 164 10.1016/j.tsf.2004.07.080
6. F.T. Xu P.P. Ye M. Curry J.A. Barnard and S.C. Street 2002 Tribol. Lett. 12 189 10.1023/A:1014763425001
7. A. Rar J.N. Zhou W.J. Liu J.A. Barnard A. Bennett and S.C. Street 2001 Appl. Surf. Sci. 134 175-176
8. A. Rar M. Curry J.A. Barnard and S.C. Street 2002 Tribol. Lett. 12 87 10.1023/A:1014078112454
9. X. Li M. Curry G. Wei J. Zhang J.A. Barnard S.C. Street and M.L. Weaver 2004 Surf. Coat. Technol. 177 504 10.1016/S0257-8972(03)00919-8
10. S.C. Street A. Rar J.N. Zhou W.J. Liu and J.A. Barnard 2001 Chem.Mater. 13 3669 10.1021/cm000981e
11. W.D. Nix 1989 Metall. Trans. 20 2217
12. D.N. Dunn R. Hull F.M. Ross and R.M. Tromp 2001 J. Appl. Phys. 89 2635 10.1063/1.1337078
13. M. Li G.-C. Wang and H.-G. Min 1998 J. Appl. Phys. 83 5313 10.1063/ 1.367357
14. S.K. Sinha, E.B. Sirota, S. Garo. and H.B. Stanley, Phys. Rev. B38 (1988) 2297.
15. R. Chiarello V. Panella J. Krim and C. Thompson 1991 Phys. Rev. Lett. 67 3408 10.1103/PhysRevLett.67.3408 10044726
16. J.P. Schlomka M. Tolan L. Schwalowsky O.H. Seeck J. Stettner and W. Press 1995 Phys. Rev. B 51 2311 10.1103/PhysRevB.51.2311
17. S. Zhang D. Sun Y. Fu H. Du and Q. Zhang 2004 Diam. Relat. Mater. 13 1777 10.1016/j.diamond.2004.03.008
18. H. Deng T.W. Scharf and J.A. Barnard 1997 J. Appl. Phys. 81 5396 10.1063/ 1.364551
19. B. Bhushan B.K. Gupta M. Azarian 1995 Wear 181 743
20. J. Sekler P.A. Steinmann and H.E. Hintermann 1988 Surf. Coat. Technol. 36 519 10.1016/0257-8972(88)90179-X
21. G. Berg C. Friedrich E. Broszeit and C. Berger 1997 Fresenius J. Anal. Chem. 358 281 10.1007/s002160050407
22. P.A. Steinmann and H.E. Hintermann 1989 J, Vac. Sci. Technol. A7 2267
23. X. Li, F. Huang, M. Curry, S.C. Street and M.L. Weaver, in: Surface and Interfaces in Nanostructured Materials and Trends in LIGA, Miniaturization, and Nanoscale Materials, edited by Mukhopadhyay, S.M., Seal, S., Dahotre, N., Agarwal, A., Smugeresky, J.E. and Moody, N. (The Minerals, Metals & Materials Society, Charlotte, NC, 2004) p. 287
24. C.V. Thompson 1993 J. Mater. Res. 8 237
25. A. Kelly and N.H. MacMillan 1986 Strong Solids Clarendon Oxford, UK
26. K. Kato 1997 Tribol. Int. 30 333 10.1016/S0301-679X(96)00063-1
27. M.Y. He A.G. Evans and J.W. Hutchinson 1998 Mater. Sci. Eng. A 245 168 10.1016/S0921-5093(97)00848-4
28. J.F. Moulder W.F. Stickle P.E. Sobol and K.D. Bomben 1995 Handbook of X-ray Photoelectron Spectroscopy Physics Electronics Eden Prairie, MN
29. M. Curry, X. Li, J. Zhang, M.L. Weaver and S.C. Street, submitted to Thin Solid Films (2005).