Molecular grafting to silicon surfaces in air using organic triazenes as stable diazonium sources and HF as a constant hydride-passivation source

Chemistry of Materials

Volumn 17, Issue 19, 2005, Pages 4832-4836

  Chen, Bo ^a   Flatt, Austen K ^a   Jian, Huahua ^a   Hudson, Jared L ^a   Tour, James M ^a  

^a RICE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AIR; GRAFTING (CHEMICAL); MONOLAYERS; PASSIVATION; SALTS; SURFACE TREATMENT;

ARYL MOLECULES; ARYLDIAZONIUM SALTS; SILICON SURFACE; SPONTANEOUS SURFACE GRAFTING;

SILICON;

EID: 25844477144     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm051104h     Document Type: Article

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