Structure and composition of thermally annealed Mo- and W-based CVD metal oxide thin films

Thin Solid Films

Volumn 492, Issue 1-2, 2005, Pages 322-326

  Gesheva, K ^a   Cziraki, A ^b   Ivanova, T ^a   Szekeres, A ^c  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b EÖTVÖS LORÁND UNIVERSITY   (Hungary)

^c INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Chemical vapor deposition; Crystallization; Ellipsometry; Metal oxide films; Raman scattering; X ray diffraction

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; CRYSTALLIZATION; ELLIPSOMETRY; FILM GROWTH; MOLYBDENUM COMPOUNDS; RAMAN SCATTERING; TUNGSTEN; X RAY DIFFRACTION;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION (APCVD); METAL OXIDE FILMS; MIXED OXIDES; THERMAL ANNEALING;

THIN FILMS;

EID: 25644454522     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.023     Document Type: Article

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