Pattern formation in SiSb system

Vacuum

Volumn 80, Issue 1-3, 2005, Pages 168-173

  Csik, A ^a,b   Erdelyi G ^a   Langer, G A ^a   Daroczi L ^a   Beke, D L ^a   Nyeki J ^a   Erdelyi Z ^a  

^a UNIVERSITY OF DEBRECEN   (Hungary)

^b INSTITUTE OF NUCLEAR RESEARCH ATOMKI   (Hungary)

Author keywords

Amorphous SiSb alloy; Crystallization; Decomposition; Segregation

Indexed keywords

AMORPHOUS SISB ALLOY; PATTERN FORMATION; THERMAL ANNEALING;

ANNEALING; ARGON; CRYSTALLIZATION; DECOMPOSITION; INTERFACES (MATERIALS); NANOSTRUCTURED MATERIALS; PRESSURE EFFECTS; SEGREGATION (METALLOGRAPHY); THERMOANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

SILICON COMPOUNDS;

EID: 25644446793     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.08.014     Document Type: Conference Paper

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