Sb diffusion and segregation in amorphous Si thin films

Defect and Diffusion Forum

Volumn 237-240, Issue PART 2, 2005, Pages 1246-1251

  Nyeki J ^a,b   Girardeaux, C ^b   Erdelyi Z ^a   Csik, A ^a   Daroczi L ^a   Langer, G ^a   Beke, D L ^a   Rolland, A ^b   Bernardini, J ^b   Erdelyi G ^a  

^a UNIVERSITY OF DEBRECEN   (Hungary)

^b CNRS   (France)

Author keywords

Amorphous Si; Auger electron spectroscopy; Nanoscale diffusion; Segregation; Surface segregation kinetics; Thin films

Indexed keywords

AMORPHOUS SILICON; ANTIMONY; AUGER ELECTRON SPECTROSCOPY; DIFFUSION; REACTION KINETICS; SEGREGATION (METALLOGRAPHY);

AMORPHOUS SI; NANOSCALE DIFFUSION; SURFACE SEGREGATION KINETICS;

THIN FILMS;

EID: 25644442721     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.237-240.1246     Document Type: Conference Paper

References (9)

1. S.F. Gong, H.T.G. Hentzell and A.E. Robertsson: J. Appl. Phys., Vol. 64 (1988) p. 1457
2. M. P. Seah and W. A. Dench: Surface and Interface analysis, Vol.1 (1979) p.1
3. J. Nyéki, C. Girardeaux, G. Erdélyi, A. Rolland and J. Bernardini: Applied Surface Science Vol. 212 (2003) p.244
4. C. Lea and M.P. Seah, Phil. Mag. Vol. 35 (1997) p.210
5. S. Coffa, J.M. Poate, D.C. Jacobson, W. Frank and W. Gustin: Phys. Rev. B, Vol. 45, (1992) p.8355
6. W. Frank, W. Gustin, S. Coffa and D.C. Jacobson:Mater: Sci. Forum, Vol. 83-87 (1992) p.103
7. W. Frank: Def. Diff. Forum Vol. 75 (1991) p.365
8. x: Diffusion, Ségrégation, Désorption et Effet Surfactant, (2002) 101-103
9. R.N. Ghoshtagore: Phys. Rev. B Vol. 3 (1971) p.397