Thermal stability and crystallization of amorphous Si1-xBx, Si1-xPx and Si1-xSbx alloy thin films

Thin Solid Films

Volumn 300, Issue 1-2, 1997, Pages 51-58

  Carlsson, J R A ^a   Sundgren, J E ^a   Madsen, L D ^a   Li, X H ^a,b   Hentzell, H T G ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b ABB CORPORATE RESEARCH   (Sweden)

Author keywords

Amorphous materials; Crystallization; Phase transitions; Silicides

Indexed keywords

CHEMICAL BONDS; CRYSTALLIZATION; FREE ENERGY; GIBBS FREE ENERGY; PHASE TRANSITIONS; SILICON ALLOYS; THERMAL EFFECTS; THERMODYNAMIC STABILITY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM); SILICIDES;

AMORPHOUS FILMS;

EID: 0031139780     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09499-0     Document Type: Article

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