Effects of oxygen pressure on optical and crystal properties of ZnO thin films prepared by laser molecular beam epitaxy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5774, Issue , 2005, Pages 462-465

  Xu, Qing'an ^a,b   Zhang, Jingwen ^a,b   Yang, Xiaodong ^a,b   He, Yongning ^a   Zhang, Weifeng ^c   Hou, Xun ^a,b,c  

^a XI AN INSTITUTE OF OPTICS AND PRECISION MECHANICS   (China)

^b XI'AN JIAOTONG UNIVERSITY   (China)

^c HENAN UNIVERSITY   (China)

Author keywords

L MBE; RHEED, Oxygen pressure; ZnO

Indexed keywords

DIFFRACTION; MOLECULAR BEAM EPITAXY; OPTICAL PROPERTIES; OXYGEN; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; THIN FILMS; X RAY DIFFRACTION;

L-MBE; RHEED, OXYGEN PRESSURE; SAPPHIRE SUBSTRATES;

ZINC OXIDE;

EID: 25644444654     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.608176     Document Type: Conference Paper

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