Dynamic scaling phenomena and universality classes in growth of iron nitride thin films deposited by direct current magnetron sputtering

Thin Solid Films

Volumn 492, Issue 1-2, 2005, Pages 75-78

  Wang, X ^a,b   Zheng, W T ^a   Wang, L L ^a   Tian, H W ^a   Yu, S S ^a   Meng, F L ^a   Li, X T ^a   Kong, X G ^b  

^a Jilin University   (China)

^b CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

Dynamic scaling phenomena; Growth mechanism; Nitrides; Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; GROWTH (MATERIALS); MAGNETRON SPUTTERING; NITRIDES; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; X RAY SCATTERING;

DYNAMIC SCALING PHENOMENA; GAS MIXTURES; GROWTH MECHANISM; NONTRIVIAL EXPONENTS;

IRON COMPOUNDS;

EID: 25644438307     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.058     Document Type: Article

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