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Volumn 16, Issue 10, 2005, Pages 1983-1985
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Novel one-dimensional nanogap created with standard optical lithography and evaporation procedures
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Author keywords
[No Author keywords available]
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Indexed keywords
COATING TECHNIQUES;
ELECTRIC VARIABLES MEASUREMENT;
EVAPORATION;
HYDROFLUORIC ACID;
NANOTECHNOLOGY;
OXIDES;
SCANNING ELECTRON MICROSCOPY;
SILICON COMPOUNDS;
ELECTRICAL MEASUREMENTS;
METAL EVAPORATION;
NANOGAPS;
PHOTOLITHOGRAPHY;
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EID: 25444521028
PISSN: 09574484
EISSN: None
Source Type: Journal
DOI: 10.1088/0957-4484/16/10/001 Document Type: Article |
Times cited : (28)
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References (13)
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