Structural and electronic properties of thin fluorite-structure NiSi 2, CoSi 2 and FeSi 2 interfaces and precipitates in Si

Physica Status Solidi (A) Applications and Materials Science

Volumn 202, Issue 5, 2005, Pages 883-888

  Wardle, M G ^a   Goss, J P ^a   Briddon, P R ^a   Jones, R ^b  

^a NEWCASTLE UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF EXETER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY FUNCTIONAL METHODS; DISILICIDES; ENERGY INTERFACE STRUCTURES; INTERFACE GEOMETRY;

COBALT COMPOUNDS; ELECTRONIC PROPERTIES; FLUORSPAR; INTERFACES (COMPUTER); PRECIPITATION (CHEMICAL); PROBABILITY DENSITY FUNCTION; SCHOTTKY BARRIER DIODES; SILICON;

NICKEL COMPOUNDS;

EID: 25444495898     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200460508     Document Type: Conference Paper

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