High-q integrated inductors on trenched silicon Islands

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2005, Pages 199-202

  Raieszadeh, Mina ^a   Monajemi, Pejman ^a   Yoon, Sang Woong ^a   Laskar, Joy ^a   Ayazi, Farrokh ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYOGENICS; ELECTRONICS PACKAGING; MICROMACHINING; NATURAL FREQUENCIES; SILICON WAFERS; SUBSTRATES;

AIR SUSPENSION; FABRICATION SEQUENCE; INTEGRATED INDUCTORS; SILICON SUBSTRATES;

ELECTRIC INDUCTORS;

EID: 25444438613     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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8. G. Wang, et al. "Finite Ground Coplanar Lines on CMOS Grade Silicon with a Thick Embedded Silicon Oxide Layer Using Micromachining Techniques," 33rd European Microwave Conference, vol. I, 2003, pp. 25-27.