Finite Ground Coplanar lines on CMOS grade silicon with a thick embedded silicon oxide layer using micromachining techniques

Conference Proceedings - 33rd European Microwave Conference, EuMC 2003

Volumn 1, Issue , 2003, Pages 25-28

  Wang, Guoan ^a   Bacon, Andrew ^a   Abdolvand, Reza ^a   Ayazi, Farrokh ^a   Papapolymerou, John ^a   Tentzeris, Emmanouil M ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MICROMECHANICS; MICROMACHINING; SCATTERING PARAMETERS; SILICON OXIDES;

ATTENUATION LOSS; COPLANAR LINES; MICROMACHINING TECHNIQUES; SILICON OXIDE LAYERS; WAVEGUIDE TRANSMISSION LINE;

SILICON WAFERS;

EID: 4544253270     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EUMC.2003.1262209     Document Type: Conference Paper

References (9)

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