Optimization of sub-100-nm designs for mask cost reduction

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 2, 2004, Pages 322-331

  Balasinski, Artur ^a  

^a CYPRESS SEMICONDUCTOR   (United States)

Author keywords

Critical dimensional budget; Cycle time; Design optimization; Device parameter extraction; Integrated simulation; Mask cost; Optical proximity correction; Sub 100 nm process

Indexed keywords

CRITICAL DIMENSIONAL BUDGET; CYCLE TIME; DEVICE PARAMETER EXTRACTION; INTEGRATED SIMULATION; MASK COST; OPTICAL PROXIMITY CORRECTION; SUB-100 NM PROCESS;

COMPUTER AIDED DESIGN; COST EFFECTIVENESS; DATABASE SYSTEMS; MOSFET DEVICES; OPTIMIZATION; PARAMETER ESTIMATION; PHASE SHIFT; SEMICONDUCTING SILICON; STATISTICAL METHODS;

MASKS;

EID: 2542463397     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1668275     Document Type: Article

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