Integrating CD and lithographic process window analysis with mask data preparation for subwavelength ICs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 74-82

  Joshi, Devendra ^a   Keogan, Danny ^a   Falbo, James K ^a  

^a SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA ACQUISITION; INTEGRATED CIRCUITS; LITHOGRAPHY; PHASE SHIFT;

DATA MANAGEMENT;

MASKS;

EID: 0038304086     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467847     Document Type: Conference Paper

References (2)

1. Paul DePesa, Todd E. Pegelow, "Automated critical dimension and registration communication", SPIE Proceedings Vol. 1604, p. 26-33, 1992
2. CATS Command Reference Manual, Version 22, Numerical Technologies Inc.