Investigation of SOI photonic crystals fabricated by both electron-beam lithography and nanoimprint lithography

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 405-411

  Belotti, M ^a,b   Galli, M ^a   Bajoni, D ^a   Andreani, L C ^a   Guizzetti, G ^a   Decanini, D ^b   Chen, Y ^b  

^a UNIVERSITY OF PAVIA   (Italy)

^b CNRS   (France)

Author keywords

Electron beam lithography; Nanoimprint; Photonic crystals

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTALS; ELECTRON BEAM LITHOGRAPHY; ETCHING; LATTICE CONSTANTS; LIGHT PROPAGATION; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY;

ION ETCHING; NANOIMPRINT; PHOTONIC CRYSTALS; PHOTONIC LATTICES;

PHOTONS;

EID: 2542447682     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00144-3     Document Type: Conference Paper

References (24)

1. Yablonovitch E. Phys. Rev. Lett. 58:1987;2059.
2. John S. Phys. Rev. Lett. 58:1987;2486.
3. Joannopoulos J.D., Meade R.D., Winn J.N. Photonic Crystals. 1995;Princeton University Press, Princeton, NJ.
4. Galli M., Agio M., Andreani L.C., Belotti M., Guizzetti G., Marabelli F., Patrini M., Bettotti P., Dal Negro L., Gaburro Z., Pavesi L., Lui A., Bellutti P. Phys. Rev. B. 65:2002;113111.
5. Patrini M., Galli M., Marabelli F., Agio M., Andreani L.C., Peyrade D., Chen Y. IEEE J. Quant. Electron. 38:2002;885-890.
6. Johnson S.G., Fan S., Villeneuve P.R., Joannopoulos J.D., Kolodziejski L.A. Phys. Rev. B. 60:1999;5751.
7. Baba T., Fukaya N., Yonekura J. Electron. Lett. 27:1999;654.
8. Benisty H., Labilloy D., Weisbuch C., Smith C.J.M., Krauss T.F., Cassagne D., Béraud A., Jouanin C. Appl. Phys. Lett. 76:2000;532.
9. Loncar M., Nedeljkovic D., Doll T., Vuckovic J., Scherer A., Pearsall T.P. Appl. Phys. Lett. 77:2000;1937.
10. Pacradouni V., Mandeville W.J., Cowan A.R., Paddon P., Young J.F., Johnson S.R. Phys. Rev. B. 62:2000;4204.
11. Chow E., Lin S.Y., Johnson S.G., Villeneuve P.R., Joannopoulos J.D., Wendt J.R., Vawter G.A., Zubrzycki W., Hou H., Alleman A. Nature. 407:2000;983.
12. Ochiai T., Sakoda K. Phys. Rev. B. 63:2001;125107.
13. Chou S.Y., Krauss P.R., Renstrom P.J. J. Vac. Sci. Technol. B. 14:1996;4129.
14. Krauss P.R., Chou S.Y. J. Vac. Sci. Technol. B. 13:1995;2850.
15. Faircloth B., Rohrs H., Tiberio R., Ruoff R., Krchnavek R.R. J. Vac. Sci. Technol. B. 18:2000;1866.
16. Chen Y., Lebib A., Li S., Pépin A., Peyrade D., Natali M., Cambril E. Eur. Phys. J.: Appl. Phys. 12:2000;223.
17. Lebib A., Chen Y., Carcenac F., Cambril E., Manin L., Courand L., Launois H. Microelectron. Eng. 53:2000;175.
18. Astratov V.N., Skolnick M.S., Brand S., Krauss T.F., Karimov O.Z., Stevenson R.M., Whittaker D.M., Culshaw I.S., DelaRue R.M. IEE. Proc. Otoelectron. 145(6):1998;398.
19. Astratov V.N., Whittaker D.M., Culshaw I.S., Stevenson R.M., Skolnick M.S., Krauss T.F., DelaRue R.M. Phys. Rev. B. 60(24):1999;16255.
20. Astratov V.N., Stevenson R.M., Culshaw I.S., Whittaker D.M., Skolnick M.S., Krauss T.F., De la Rue R.M. Appl. Phys. Lett. 77(2):2000;178.
21. Pacradouni V., Mandeville W.J., Cowan A.R., Paddon P., Young J.F., Johnson S.R. Phys. Rev. B. 62(7):2000;4204.
22. Whittaker D.M., Culshaw I.S. Phys. Rev. B. 60(4):1999;2610.
23. M. Galli, M. Belotti, F. Paleari, D. Bajoni, M. Agio, D. Gerace, G. Guizzetti, L.C. Andreani, Y. Chen, submitted.
24. Andreani L.C., Agio M. Appl. Phys. Lett. 82:2003;2011.