Impact of polarization for an attenuated phase shift mask with ArF hyper-NA lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 1063-1069

  Sato, Takashi ^a   Endo, Ayako ^a   Mimotogi, Akiko ^a   Mimotogi, Shoji ^a   Sato, Kazuya ^a   Tanaka, Satoshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Attenuated phase shift mask; Pattern; Polarization; Simulation; Transmission

Indexed keywords

ATTENUATION; COMPUTER SIMULATION; LIGHT POLARIZATION; LIGHT SOURCES; LIGHTING; LITHOGRAPHY; OPTICAL RESOLVING POWER; PHASE SHIFT;

ATTENUATED PHASE SHIFT MASKS; PATTERN; POLARIZATION IMAGING; TRANSMISSION;

MASKS;

EID: 25144521676     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598458     Document Type: Conference Paper

References (6)

1. B. J. Lin, "Immersion lithography and its impact on semiconductor manufacturing," J. Microlith., Microfab., Microsys., Vol. 3, No. 3, pp. 377, 2004.
2. D. G. Flagelloa, B. Arnolda, S. Hansena, M. Dusab, R. Sochab, J. Mulkensc, R. Garreisd, "Optical Lithography in the sub-50nm regime," Proc. SPIE, Vol. 5377, pp. 21, 2004.
3. S. Mimotogi, F. Uesawa, S. Kyoh, H. Fujise, E. Shiobara, M. Katsumata, H. Hane, T. Sugiyama, K. Sho, M. Miyazaki, K. Takahata, H. Kanai and K. Hashimoto, "Optical Lithography Technologies for 45nm-Node CMOS," SPIE Microlithography Conference 2005, 5754-18.
4. A. Erdmann, "Topography effects and wave aberrations in advanced PSM technology," Proc. SPIE Vol. 4346, pp. 345, 2001.
5. T. A. Brunner, N. Seong, W. D. Hinsberg, J. A. Hoffnagle, F. A. Houle, M. I. Sanchez, "High-NA lithographic imagery at Brewster's angle" Proc. SPIE, Vol. 4691, pp. 1, 2002.
6. T. V. Pistor, A. R. Neureuther, R. J. Socha, "Modeling oblique incidence effects in photomasks," Proc. SPIE 4000, pp. 228, 2000.