Abnormal residual stress state in ZnO films synthesized by planar magnetron sputtering system with two facing targets

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 164-167

  Hanabusa, Takao ^a   Hosoda, Hiroyoshi ^a   Kusaka, Kazuya ^a   Tominaga, Kikuo ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

c axis orientation; Planar magnetron sputtering; Residual strain; X ray diffraction; ZnO film; splitting

Indexed keywords

CURRENT DENSITY; FILM PREPARATION; MAGNETRON SPUTTERING; RESIDUAL STRESSES; SHEAR STRESS; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL); X RAY CRYSTALLOGRAPHY;

ABNORMAL RESIDUAL STRESS STATE; PLANAR MAGNETRON SPUTTERING SYSTEMS;

SUPERCONDUCTING FILMS;

EID: 0032628506     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01654-X     Document Type: Article

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