Micromachining thin film by using Near-field photo-patterning of organic self-assembled monolayers

Journal of the Korean Physical Society

Volumn 47, Issue SUPPL. 1, 2005, Pages

  Chang, Won Seok ^a   Kim, Jaegu ^a   Cho, Sung Hak ^a   Choi, Moojin ^b  

^a Korea Institute of Machine and Materials   (South Korea)

^b Facilities Management Team   (South Korea)

Author keywords

Femtosecond laser; NSOM nanolithography; Self assembled monolayers (SAMs)

Indexed keywords

EID: 25144492374     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (14)

1. S. Wegscheider, A. Kirsch, J. Mlynek and G. Krausch, Thin Solid Films 264, 264 (1995).
2. J. S. Cha, J. H. Park, M. R. Kim and W. Jhe, J. Korean Phys. Soc. 37, 735 (2000).
3. S. Sun and G. J. Leggett, Nano Lett. 4, 1381 (2004).
4. S. Y. Yim, E. Jeang, J. H. Lee, S. H. Park and K. Cho, J. Korean Phys. Soc. 45, 1060 (2004).
5. R. Maboudian, W. R. Ashurst and C. Carraro, Sensor. Actuat. A-Phys. 82, 219 (2000).
6. A. Smith, M. J. Wanat, Y. Cheng, S. V. P. Barreira, A. G. Frutos and R. M. Corn, Langmuir 17, 2502 (2001).
7. M. J. Tarlov, D. R. F. Burgess and G. Gillen, J. Am. Chem. Soc. 115, 5305 (1993).
8. J. Huang and J. Hemminger, J. Am. Chem. Soc. 115, 3342 (1993).
9. Y. Zhang, R. H. Terrill, T. A. Tanzer and P. W. Bohn, J. Am. Chem. Soc. 120, 2654 (1998).
10. S. Sun, K. S. L. Chong and G. J. Leggett, J. Am. Chem. Soc. 124, 2414 (2002).
11. K. L. Norrod and K. L. Rowlen, J. Am. Chem. Soc. 120, 2656 (1998).
12. W. Chang, M. Choi, J. Kim, S. Cho and K. Whang, Trans. KSME A 28, 1270 (2004).
13. Y. M. Jung, S. J. Ahn, E. R. Kim and H. Lee, J. Korean Phys. Soc. 40, 712 (2002).
14. M. S. Son, E. R. Kim and H. Lee, J. Korean Phys. Soc. 41, 949 (2002).