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Volumn 5754, Issue PART 2, 2005, Pages 638-645

Laser-induced birefringence in fused silica from polarized lasers

Author keywords

Birefringence; Fused silica; Laser induced damage; Strain; Wavefront distortion

Indexed keywords

ANISOTROPY; COMPOSITION; EXCIMER LASERS; FUSED SILICA; LASER BEAM EFFECTS; LASER DAMAGE; LIGHT POLARIZATION; STRAIN; WAVEFRONTS;

EID: 25144465424     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598741     Document Type: Conference Paper
Times cited : (8)

References (11)
  • 1
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    • Behavior of fused silica irradiated by low level 193 nm excimer laser for tens of billions of pulses
    • C. K. Van Peski, R. Morton, Z. Bor, "Behavior of fused silica irradiated by low level 193 nm excimer laser for tens of billions of pulses", J. Non-Cryst. Solids 265, p. 285, 2000.
    • (2000) J. Non-Cryst. Solids , vol.265 , pp. 285
    • Van Peski, C.K.1    Morton, R.2    Bor, Z.3
  • 3
    • 78049495304 scopus 로고    scopus 로고
    • Behavior of fused silica under 193 nm irradiation
    • C. K. Van Peski, "Behavior of Fused Silica Under 193 nm Irradiation", Sematech Technology Transfer # 00073974A-TR (2000), available at http://www.sematech.org/docubase/document/3974atr.pdf
    • (2000) Sematech Technology Transfer # 00073974A-TR
    • Van Peski, C.K.1
  • 4
    • 0032631157 scopus 로고    scopus 로고
    • Measurement and analysis of compaction in fused silica
    • D. C. Allan, C. Smith, and N. F. Borrelli, "Measurement and analysis of compaction in fused silica", Proc. SPIE 3578, 16-27 (1998).
    • (1998) Proc. SPIE , vol.3578 , pp. 16-27
    • Allan, D.C.1    Smith, C.2    Borrelli, N.F.3
  • 5
    • 0001187910 scopus 로고    scopus 로고
    • 193-nm excimer-laser-induced densification of fused silica
    • D. C. Allan, C. Smith, N. F. Borrelli, and T. P. Seward III, "193-nm excimer-laser-induced densification of fused silica", Opt. Lett. 21, p. 1960-1962, 1996.
    • (1996) Opt. Lett. , vol.21 , pp. 1960-1962
    • Allan, D.C.1    Smith, C.2    Borrelli, N.F.3    Seward III, T.P.4
  • 6
    • 0030314785 scopus 로고    scopus 로고
    • Material limitations to 193-nm lithographic system lifetimes
    • R. Schenker, F. Piao, and W. U. Oldham, "Material limitations to 193-nm lithographic system lifetimes", Proc. SPIE 2726, p. 698-707, 1996.
    • (1996) Proc. SPIE , vol.2726 , pp. 698-707
    • Schenker, R.1    Piao, F.2    Oldham, W.U.3
  • 8
    • 3843057851 scopus 로고    scopus 로고
    • Advances in the use of birefringence to measure laser-induced density changes in fused silica
    • J. Moll, D. C. Allan, U. Neukirch, "Advances in the use of birefringence to measure laser-induced density changes in fused silica", Proc. SPIE 5377, p. 1721-1726, 2004.
    • (2004) Proc. SPIE , vol.5377 , pp. 1721-1726
    • Moll, J.1    Allan, D.C.2    Neukirch, U.3
  • 9
    • 9644254640 scopus 로고    scopus 로고
    • Compaction versus expansion behavior related to the OH-content of synthetic fused silica under prolonged UV-laser irradiation
    • B. Kühn, B. Uebbing, M. Stamminger, I. Radosevic, and S. Kaiser, "Compaction versus expansion behavior related to the OH-content of synthetic fused silica under prolonged UV-laser irradiation", J. Non-Cryst. Solids 330, p. 23-32, 2003.
    • (2003) J. Non-Cryst. Solids , vol.330 , pp. 23-32
    • Kühn, B.1    Uebbing, B.2    Stamminger, M.3    Radosevic, I.4    Kaiser, S.5
  • 11
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    • Optical properties of densified silica glasses
    • C. Z. Tan, J. Arndt, and H. S. Xie, "Optical properties of densified silica glasses", Physica B 252, p. 28-33, 1998.
    • (1998) Physica B , vol.252 , pp. 28-33
    • Tan, C.Z.1    Arndt, J.2    Xie, H.S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.