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Proceedings of SPIE - The International Society for Optical Engineering
Volumn 5756, Issue , 2005, Pages 302-312
New OPC methods to increase process margin for sub-70nm devices
Author keywords

Lithography; Model based OPC; OPC friendly layout; Process margin; Retargeting
Indexed keywords

OPTICAL DESIGN; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY;
EID: 25144461030     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600231     Document Type: Conference Paper
Times cited : (5)
References (7)
  • 1
    • 0031365084 scopus 로고    scopus 로고
    • Spatial filter models to describe IC lithographic behavior
    • J. Stirniman, and M. Rieger, " Spatial filter models to describe IC lithographic behavior" , Proc. of SPIE Vol. 3051, pp. 469-479, 1997
    • (1997) Proc. of SPIE , vol.3051 , pp. 469-479
    • Stirniman, J.1    Rieger, M.2
  • 2
    • 19844362578 scopus 로고    scopus 로고
    • Qualifying OPC model robustness to reticle noise errors and FAB process changes
    • D. Keil, N, Belova, J. Jensen and N. Callen, " Qualifying OPC model robustness to reticle noise errors and FAB process changes" , Proc. of SPIE Vol. 5567, pp. 626-637, 2004
    • (2004) Proc. of SPIE , vol.5567 , pp. 626-637
    • Keil, D.1    Belova, N.2    Jensen, J.3    Callen, N.4
  • 3
    • 0242693875 scopus 로고    scopus 로고
    • OPC methods to improve image slope and process window
    • N. Cobb and Y. Granik, " OPC methods to improve image slope and process window" , Proc. of SPIE Vol. 5042, pp. 116-125, 2003
    • (2003) Proc. of SPIE , vol.5042 , pp. 116-125
    • Cobb, N.1    Granik, Y.2
  • 4
    • 3843104609 scopus 로고    scopus 로고
    • Simulation-based critical area extraction and litho-friendly layout design for low k1 lithography
    • S. H. Choi, Y. C. Ban, K. H. Lee, D. H. Kim, J. S. Hong, Y. H. Kim, M. H. Yoo and J. T. Kong, " Simulation-based critical area extraction and litho-friendly layout design for low k1 lithography" , Proc. of SPIE Vol. 5377, pp. 713-720, 2004
    • (2004) Proc. of SPIE , vol.5377 , pp. 713-720
    • Choi, S.H.1    Ban, Y.C.2    Lee, K.H.3    Kim, D.H.4    Hong, J.S.5    Kim, Y.H.6    Yoo, M.H.7    Kong, J.T.8
  • 5
    • 0000619340 scopus 로고
    • The concept of partial coherence in optics
    • H. H. Hopkins, " The concept of partial coherence in optics" , Proc. R. Soc. London Ser A. 208, pp. 263-277, 1951
    • (1951) Proc. R. Soc. London Ser A , vol.208 , pp. 263-277
    • Hopkins, H.H.1
  • 6
    • 1842475768 scopus 로고    scopus 로고
    • Improvement of empirical OPC model robustness using full-chip aerial image analysis
    • T. Roessler, B. Frankowsky and O. Toublan, " Improvement of empirical OPC model robustness using full-chip aerial image analysis" , Proc. of SPIE Vol. 5256, pp. 222-229, 2003
    • (2003) Proc. of SPIE , vol.5256 , pp. 222-229
    • Roessler, T.1    Frankowsky, B.2    Toublan, O.3

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.