Enhanced performance of poly-Si thin film transistors using fluorine ions implantation

Electrochemical and Solid-State Letters

Volumn 8, Issue 9, 2005, Pages

  Tu, Chun Hao ^a   Chang, Ting Chang ^b   Liu, Po Tsun ^c   Zan, Hsiao Wen ^c   Tai, Ya Hsiang ^c   Yang, Che Yu ^a   Wu, Yung Chun ^a   Liu, Hsin Chou ^a   Chen, Wei Ren ^a   Chang, Chun Yen ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; FLUORINE; ION IMPLANTATION; PERFORMANCE; POLYSILICON; RAPID THERMAL ANNEALING;

DEVICE PERFORMANCE; ELECTRICAL RELIABILITY; FIELD EFFECT MOBILITY; IMMUNITY;

THIN FILM TRANSISTORS;

EID: 25144446845     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1996508     Document Type: Article

References (13)

1. H. Oshima and S. Morozumi, Tech. Dig. - Int. Electron Devices Meet., 1989, 157.
2. S. D. Brotherton, Semicond. Sci. Technol., 10, 721 (1995).
3. K. Nakazawa, J. Appl. Phys., 69, 1703 (1991).
4. T. J. King and K. C. Saraswat, IEEE Electron Device Lett., 13, 309 (1992).
5. H. Kuriyama, S. Kiyama, S. Noguchi, T. Kuahara, S. Ishida, T. Nohda, K. Sano, H. Iwata, S. Tsuda, and S. Nakano, Tech. Dig. - Int. Electron Devices Meet., 1991, 563.
6. I. W. Wu, A. G. Lewis, T. Y. Huang, and A. Chiang, IEEE Electron Device Lett., 10, 2061 (1993).
7. H. N. Chem, C. L. Lee, and T. F. Lei, IEEE Trans. Electron Devices, 41, 698 (1994).
8. J. W. Park, B. T. Ahn, and K. Lee, Jpn. J. Appl. Phys., Part 1, 34, 1436 (1995).
9. H. Matsumura, Y. Nakagome, and S. Furukawa, Appl. Phys. Lett., 36, 439 (1980).
10. C. W. Lin, M. Z. Yang, C. C. Yeh, L. J. Cheng, T. Y. Huang, H. C. Cheng, H. C. Lin, T. S. Chao, and C. Y. Chang, Tech. Dig. - Int. Electron Devices Meet., 1999, 305.
11. H. Y. Lin, C. Y. Chang, T. F. Lei, F. M. Liu, W. L. Yang, J. Y. Cheng, H. C. Tseng, and L. P. Chen, IEEE Electron Device Lett., 17, 503 (1996).
12. S. Banerjee, R. Sundaresan, H. Shichijo, and S. Malhi, IEEE Trans. Electron Devices, 35, 152 (1988).
13. M. Hack, A. G. Lewis, and I. W. Wu, IEEE Trans. Electron Devices, 40, 890 (1993).