Effects of plasma treatments, substrate types, and crystallization methods on performance and reliability of low temperature polysilicon TFTs

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1999, Pages 305-308

  Lin, C W ^a   Yang, M Z ^a   Yeh, C C ^a   Cheng, L J ^a   Huang, T Y ^a   Cheng, H C ^a   Lin, H C ^a   Chao, T S ^a   Chang, C Y ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ANNEALING; CRYSTALLIZATION; EXCIMER LASERS; LOW TEMPERATURE OPERATIONS; NITROGEN OXIDES; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; QUARTZ; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SUBSTRATES;

EXCIMER LASER ANNEALING; LOW TEMPERATURE POLYSILICON THIN FILM TRANSISTORS; PLASMA TREATMENTS; SOLID PHASE CRYSTALLIZATION;

THIN FILM TRANSISTORS;

EID: 0033352172     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.1999.824157     Document Type: Conference Paper

References (6)