XPS studies of octadecylphosphonic acid (OPA) monolayer interactions with some metal and mineral surfaces

Surface and Interface Analysis

Volumn 37, Issue 9, 2005, Pages 749-754

  McIntyre, N S ^a   Nie, H Y ^a   Grosvenor, A P ^a   Davidson, R D ^a   Briggs, D ^b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

Atomic force microscopy (AFM); Octadecylphosphonic acid (OPA); Self assembled monolayers (SAMs); X ray photoelectron spectroscopy (XPS)

Indexed keywords

BINDING ENERGY; DEPOSITION; INSULATING MATERIALS; MONOLAYERS; ORGANIC ACIDS; SUBSTRATES; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

AIR-EXPOSED SURFACES; MUSCOVITE SUBSTRATES; OCTADECYLPHOSPHONIC ACID (OPA); THIN OXIDES;

SURFACE PHENOMENA;

EID: 24944549148     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.2075     Document Type: Article

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